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AWWA ACE60052
- THMs and HAAs Formation from UV and Chlorine/Chloramine Sequential Exposure
- Conference Proceeding by American Water Works Association, 06/17/2004
- Publisher: AWWA
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Sequential application of multi-disinfectants in water treatment presents apromising approach to inactivating pathogens and minimizing disinfection byproducts(DBPs), while providing necessary residual protection. This study evaluated theformation of trihalomethanes (THMs) and haloacetic acids (HAAs) during sequentialexposure of humic acid solutions to low-pressure UV irradiation and free chlorine ormonochloramine at two sequences and neutral pH. DBP formation potential (DBPFP)were also measured. Pre-UV irradiation increased the DBP formation to some extentduring the following free chlorine or monochloramine exposures. The additional yieldsof DBPs increased with increasing UV doses. When free chlorine or monochloraminewas added before UV exposure, higher DBP formation was observed. The contributionsof UV exposure to THM and HAA formation were demonstrated to be more significantwhen disinfection byproduct formation potential (DBPFP) was measured. Includes 8 references, table, figures.
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