• AWWA ACE60052
Provide PDF Format

Learn More

AWWA ACE60052

  • THMs and HAAs Formation from UV and Chlorine/Chloramine Sequential Exposure
  • Conference Proceeding by American Water Works Association, 06/17/2004
  • Publisher: AWWA

$12.00$24.00


Sequential application of multi-disinfectants in water treatment presents apromising approach to inactivating pathogens and minimizing disinfection byproducts(DBPs), while providing necessary residual protection. This study evaluated theformation of trihalomethanes (THMs) and haloacetic acids (HAAs) during sequentialexposure of humic acid solutions to low-pressure UV irradiation and free chlorine ormonochloramine at two sequences and neutral pH. DBP formation potential (DBPFP)were also measured. Pre-UV irradiation increased the DBP formation to some extentduring the following free chlorine or monochloramine exposures. The additional yieldsof DBPs increased with increasing UV doses. When free chlorine or monochloraminewas added before UV exposure, higher DBP formation was observed. The contributionsof UV exposure to THM and HAA formation were demonstrated to be more significantwhen disinfection byproduct formation potential (DBPFP) was measured. Includes 8 references, table, figures.

Related Products

AWWA ACE59939

AWWA ACE59939

Effect of Humic Acid on Bromate Reduction by Zero Valent Iron..

$12.00 $24.00

AWWA C300-97

AWWA C300-97

Reinforced Concrete Pressure Pipe, Steel-Cylinder Type, for Water and Other Liquids..

$23.00 $45.00

AWWA MTC64614

AWWA MTC64614

RO Process Design Optimization Based on Stochastic Cost Estimation Model Coupled with Process Perfor..

$12.00 $24.00

AWWA WQTC52875

AWWA WQTC52875

Low Pressure UV Inactivation of Cryptosporidium parvum and Giardia lamblia Based on Infectivity Assa..

$12.00 $24.00