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AWWA ACE65116
- Comparing UV-H2O2 and UV-HOCl/OCl- Oxidation Processes for Aqueous Nitrobenzene Photodegradation
- Conference Proceeding by American Water Works Association, 06/01/2007
- Publisher: AWWA
$12.00$24.00
This powerpoint presentation explains how chlorine photodegrades in LPUV-irradiated waters faster than H<sub>2</sub>O2, regardless of pH;OH is a photo-product of both chlorine and H<sub>2</sub>O<sub>2</sub>; in acidic chlorine solutions, more OH is available for oxidation of organic contaminants;OH-oxidation of NB was fastest in LPUV-irradiated chlorinated solutions at pH 5;less 4-, 3-, and 2-nitrophenol were formed in pH 5 chlorinated solutions exposed to LPUV;multiple unknowns detected by HPLC-photodiode array (pH 5 free chlorine); UV-Cl<sub>2</sub> in solutions adjusted to pH 5 was the least energy-intensive UV-AOP;to oxidize 4.5 µM of NB in post-sand-filtration water would require large UV fluences (>1200 mJ cm<sup>-2</sup>) regardless of added oxidant; oxidant costs were small for both UV-HOCl/OCl<sup>-</sup> and UV-H<sub>2</sub>O<sub>2</sub> relative to lamp energy costs; and, increasing the initial H<sub>2</sub>O<sub>2</sub> dose (2.1 to 5.1 mg/L) led to the most significant reduction in required UV fluence (9360 to 4065 mJ cm<sup>-2</sup>). Includes 4 references, figures.
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