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AWWA ACE70780
- Comparison of DNA Damage and Photoreactivation of E. coli after UV-C and UV/TiO2 Irradiation
- Conference Proceeding by American Water Works Association, 11/01/2009
- Publisher: AWWA
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This powerpoint presentation begins by providing a brief overview of ultraviolet- (UV)- C disinfection. Research objectives include: compare the DNA damage and repair of E. coli after UV-C and UV/TiO<sub>2</sub> disinfection; and, explore the possible mechanism of the reactivation repression effect by UV/TiO<sub>2</sub> disinfection. Methodology included: microorganism - Strain: E. coli K12 JM109; UV-C and UV/TiO<sub>2</sub> irradiation; and, Endonuclease Sensitive Site Assay (ESS Assay). Presentation summary indicates that: E. coli DNA dimer repair is obstructed by UV/TiO<sub>2</sub> irradiation,probably resulting in subsequent photoreactivation repression; the direct damage to the photoreactivating enzyme may not bethe main reason to the repression of dimer repair, it requiresfurther investigation; and, the photoreactivation can be partially attributed to the increaseof oxidative stress in bacteria by UV/TiO<sub>2</sub> and UV/H<sub>2</sub>O<sub>2</sub>irradiation. Includes tables, figures.
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